| 摘要 |
PURPOSE:To smooth the flow processes of vacuum treatment such as sputtering and the treatments before and after the same by providing an inserting chamber installed with an auxiliary container, a vacuum treating chamber and a take-out chamber installed with an auxiliary container. CONSTITUTION:The inside of a take-out chamber 7 is evacuated to prescribed pressure by an evacuating pump 8 and after the respective chambers attain prescribed pressure, substrates 4 are fed successively from an inserting chamber 5 to a sputtering chamber 1 by a conveying mechanism. The substrates 4 are sputtered in this chamber 1, after which they are contained in the vessel 14 in the chamber 7, thence they are delivered to the atmospheric side of the chamber 7. During this time, the pretreated substrates 4 are contained in the 2nd rack 23 in the empty state of an auxiliary container 20 on the atmospheric side of the force-stage of the chamber 5, and at the stage when prescribed number of the substrates 4 are stacked in the 2nd rack 23, a revolving shaft 21 is rotated half. When prescribed number of the treated substrates 4' are stacked in the 2nd rack 27 in the empty state of an auxiliary container 24 on the atmospheric side of the post-stage of the chamber 7, a revolving shaft 5 is rotated half. The above-mentioned operations are carried out repeatedly. |
