发明名称 Reducing electrostatic charge on shaped resin articles surfaces - by exposing to low temp. plasma in nitrogen cpd. atmosphere
摘要 <p>The surface properties of a shaped synthetic resin article are modified by exposing the surface of the article to a low temp. plasma generated in a gaseous atmos. contg. a N-contg. organic cpd. at pressure 0.001-10 Torr; and then opt. contacting it with a halogen or halogen-contg. cpd. The process durably reduces electrostatic charge on the article surface. The use of a PVC resin; ethylamine, allylamine, n-butylamine, methylamine, trimethylamine, dimethylamine, n-propylamine, dimethylformamide, ethylene diamine or pyridine as the N-contg. organic cpd.; and a hydrogen halide or n-propyl fluoride, methyl chloride or bromide, allyl chloride, vinyl chloride or bromide, isopropenyl chloride, 1,1,2-trifluoroethane, 1,1-dichloroethane, chloroform or CCl4 as the halogen-contg. cpd. is claimed.</p>
申请公布号 FR2491935(A1) 申请公布日期 1982.04.16
申请号 FR19810017469 申请日期 1981.09.16
申请人 SHIN ETSU CHEMICAL CO LTD 发明人 KIYOSHI IMADA, SUSUMO UENO ET HIROKAZU NOMURA;UENO SUSUMO;NOMURA HIROKAZU
分类号 C08J7/00;B29C59/14;B29C71/04;C08J7/12;(IPC1-7):08J7/10;08L27/06;29C25/00 主分类号 C08J7/00
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