| 摘要 |
<p>A device has a detail with a number of fluid source channels for delivering the fluid to the working surface. The source channels are spaced some distance from each other, so as to distributed the fluid uniformly over the surface positioned some distance from the channels. The details with the fluid source channels also has a number of drainage openings spaced uniformly apart so as to collect and evacuate the fluid delivered by the source channels. A supporting arrangement such as a plate appropriately relatively to the detail with the fluid source channels, so that the object to be etched can be inserted between them and supported hydrostatically. This guarantees a high class accurately etched product by uniformly distributed and constantly refreshed fluid. There are no difficulties as with immersion baths and no possibilities of damage to the protective layers.</p> |
