发明名称 Semiconductor component and method of producing it
摘要 Semiconductor components and a method of producing them are provided, in which the substrate may be composed of a crystalline, non-crystalline or amorphous material. A covering layer is deposited on the substrate and a semiconductor layer is deposited on the covering layer. The covering layer is composed of BeO or ZnO and is deposited on the substrate with a preferred orientation of the crystal axis along the C-axis. The semiconductor layer grows epitaxially on the covering layer, the preferred axis of orientation of the covering layer being used as a seed for the crystalline growth of the semiconductor layer.
申请公布号 DE3124456(A1) 申请公布日期 1982.04.08
申请号 DE19813124456 申请日期 1981.06.22
申请人 FUTABA DENSHI KOGYO K.K. 发明人 MORIMOTO,KIYOSHI;TAKAGI,TOSHINORI
分类号 H01L21/20;H01L21/203;H01L21/363;H01L33/00;(IPC1-7):01L29/04;01L31/18;01L31/04;01L21/20;01L29/22;01L29/20;01L33/00 主分类号 H01L21/20
代理机构 代理人
主权项
地址