发明名称 |
Semiconductor component and method of producing it |
摘要 |
Semiconductor components and a method of producing them are provided, in which the substrate may be composed of a crystalline, non-crystalline or amorphous material. A covering layer is deposited on the substrate and a semiconductor layer is deposited on the covering layer. The covering layer is composed of BeO or ZnO and is deposited on the substrate with a preferred orientation of the crystal axis along the C-axis. The semiconductor layer grows epitaxially on the covering layer, the preferred axis of orientation of the covering layer being used as a seed for the crystalline growth of the semiconductor layer.
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申请公布号 |
DE3124456(A1) |
申请公布日期 |
1982.04.08 |
申请号 |
DE19813124456 |
申请日期 |
1981.06.22 |
申请人 |
FUTABA DENSHI KOGYO K.K. |
发明人 |
MORIMOTO,KIYOSHI;TAKAGI,TOSHINORI |
分类号 |
H01L21/20;H01L21/203;H01L21/363;H01L33/00;(IPC1-7):01L29/04;01L31/18;01L31/04;01L21/20;01L29/22;01L29/20;01L33/00 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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