发明名称 |
Process for producing hydrated iron oxide having silicon and phosphorus component |
摘要 |
A hydrated iron oxide comprising a silicon component and a phosphorus component is produced by adding a silicate and a phosphate in an aqueous solution of a base and mixing it with an aqueous solution of a ferrous if necessary with a small amount of zinc ion and oxidizing it under controlling pH in a range of 5.5 to 7.5.
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申请公布号 |
US4323464(A) |
申请公布日期 |
1982.04.06 |
申请号 |
US19800143512 |
申请日期 |
1980.04.24 |
申请人 |
TDK ELECTRONICS CO., LTD. |
发明人 |
UMEKI, SHINJI |
分类号 |
C01G49/00;C01G49/02;G11B5/706;H01F1/11;(IPC1-7):C01G49/06 |
主分类号 |
C01G49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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