发明名称 Process for producing hydrated iron oxide having silicon and phosphorus component
摘要 A hydrated iron oxide comprising a silicon component and a phosphorus component is produced by adding a silicate and a phosphate in an aqueous solution of a base and mixing it with an aqueous solution of a ferrous if necessary with a small amount of zinc ion and oxidizing it under controlling pH in a range of 5.5 to 7.5.
申请公布号 US4323464(A) 申请公布日期 1982.04.06
申请号 US19800143512 申请日期 1980.04.24
申请人 TDK ELECTRONICS CO., LTD. 发明人 UMEKI, SHINJI
分类号 C01G49/00;C01G49/02;G11B5/706;H01F1/11;(IPC1-7):C01G49/06 主分类号 C01G49/00
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