发明名称 HARD PHOTOMASK SUBSTRATE AND MASK FORMING METHOD
摘要 PURPOSE:To prevent missing of a pattern and shift of a position, by forming a metallic film connected to a metallic film which has covered the surface of a transparent glass substrate, on the side of the substrate, and discharging the charge accumulated on a resist in case of exposure by an electronic beam. CONSTITUTION:The surface and the side of a substrate 1 are provided with metallic films 3, 3', and the metallic film 3 on the surface is covered with a resist 2. The upper part of a holder 4 contacts with the substrate 1 on the upper surface of the resist 2, but since a conductive pin 5 contacts with the metallic film 3' of the side surface, the charge accumulated in the resist 2 escapes to the pin 5 through the metallic film 3' of the side surface from the metallic film 3 of the surface. Accordingly, it is possible to prevent mismatching of an exposure pattern, which is caused by the fact that the charge exists in the resist. In case the second metallic film connected to the metallic film on the surface is provided on the reverse side, the electronic beam exposure is executed, discharging the charge accumulated in the resist of the surface from the metallic film of the reverse side.
申请公布号 JPS5756842(A) 申请公布日期 1982.04.05
申请号 JP19800130590 申请日期 1980.09.22
申请人 FUJITSU KK 发明人 NAGATA TAKEO;HISATSUGU NORISHIGE
分类号 G03F1/00;G03F1/54;H01L21/027 主分类号 G03F1/00
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