| 摘要 |
PURPOSE:To facilitate the separation after a contact printing by lowering the surface free energy of a substrate coated with photosensitive resin and contact printing it. CONSTITUTION:An emulsion mask is covered on a side to be cntact printed, and Cr is covered on a glass substrate at the side to be printed as a plate coated with photoresist. The plate to be covered with the resist is dipped in developer for approx. 30sec is then washed with pure water, and is then dried with N2. Even if the treated plate is contact printed, the separation after the printing can be facilitated so that the resist do not separated. When it is developed after the exposure, a resist pattern of high accuracy can be obtained in the same manner as the conventional one. When it thus dipped in the developer before the exposure, uneven surface is produced in molecular level to substantially lower the surface free energy. Since uniform and low surface energy level is formed on the entire surface of the plate, another mutual action is not induced newly in contact printing. In order to lower the surface free energy, it may additionally be dipped in specific solution or may also be injected with ions to the resist. |
