| 摘要 |
PURPOSE:To protect the surface of a detection element and at the same time to avoid the deterioration of the magnetic characteristics, by forming the detection element with a colored insulator and accordingly securing the accurate decision for the etching end point. CONSTITUTION:A silicon dioxide layer 2 is formed on a bubble crystal 1, and a detection element 3 is formed on the layer 2 with permalloy. Then a Cr2O3 film 5 is formed on the element 3, and then another silicon dioxide layer 4 is formed. Only the Cr2O3 layer can be etched based on the difference of colors between the brown layer 5 and the permalloy having the metallic luster. |
