发明名称 AKUTEIBU*MATORIKUSU*MASUKU
摘要 PURPOSE:To increase the efficiency of work and improve the reliability of an address by a method wherein a pattern to be a mark for detecting a position is formed on a photomask for active matrix IC formed of a repeated pattern. CONSTITUTION:On the mask other than that on the repeated pattern formed in the directions X and Y, a numeral is put, as the mark, on the right and left sides and on the upper and lower sides of the repeated pattern so as to make a pair with the latter. By this constitution, the efficiency of the work including the modification of the pattern and the analysis of a completed article is improved.
申请公布号 JPS5754318(A) 申请公布日期 1982.03.31
申请号 JP19800129647 申请日期 1980.09.18
申请人 SUWA SEIKOSHA KK 发明人 KATSUYAMA YASUO
分类号 H01L21/02;G03F1/00;G03F1/38;G03F7/20;H01L21/027;H01L21/66 主分类号 H01L21/02
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