| 摘要 |
PURPOSE:To prevent the generation of the bird's beak on a selective oxide layer by a method wherein, after an oxide film pattern has been formed on a substrate, an anti-oxidation film is formed in such a manner that it is covering the end section of the oxide film and then a patterning is performed. CONSTITUTION:A thermal oxide film (600Angstrom in thickness) 6 is formed on an Si substrate 1 and after a selective etching has been performed on the prescribed region, a nitriding film 7 of approximately, 1,300Angstrom in thickness is formed on the whole surface. Then an oxidation-resistant mask is formed by performing a selective etching on the nitriding film 7. The selective etching is to be performed in such a manner that the aperture end section of the oxide film 6 is covered by the nitriding film 7. Subsequently, an oxidation treatment is performed in the atmosphere of steam of 1,000 deg.C and an oxide film 9 of approximately 6,000Angstrom in thickness is formed at the exposed part of the substrate. Through these procedures, no oxygen is feeded through the oxide film 6 of the mask F layer when a selective oxidation is performed and the selective oxide film having least lateral oxidation can be formed. |
