发明名称 |
Sublimation patterning process. |
摘要 |
<p>A method for patterning layers of material on a substrate without photoresist by using a selective sublimation process. A substrate (1) having a high thermal conductivity has a patterned layer (2) of a material having a low thermal conductivity deposited on its surface. A layer of high thermal conductivity patterning material (3, 5) is then deposited over the entire surface of the structure. A radiated energy source (4) is focused on the structure for sufficient time to allow the patterning material (3) above the low thermal conductivity material (2) to build up the internal heat level for sublimation. The patterning material (5) over the high thermal conductivity substrate (1) does not build up enough internal heat for sublimation and remains intact.</p> |
申请公布号 |
EP0048328(A2) |
申请公布日期 |
1982.03.31 |
申请号 |
EP19810106001 |
申请日期 |
1981.07.30 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
SCHULTE, ERIC F.;PORTER, VERNON R. |
分类号 |
H01L21/302;H01L21/3065;H01L21/321;H01L21/768;H05K3/14;(IPC1-7):01L21/60;01L21/31;01L21/00 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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