发明名称 PROCESS FOR MAKING SEMICONDUCTOR COMPONENTS WITH OPTOELECTRONIC CONVERSION PROPERTIES
摘要 <p>The top surface of a wafer of p-type ZnTe semiconductor material is subjected to double diffusion of an acceptor impurity and of a donor impurity so as to create in the ZnTe on the one hand a compensated region having high resistivity and on the other hand a surface injection region of small thickness, a metallic contact being finally formed on each face of the wafer.</p>
申请公布号 DE2962212(D1) 申请公布日期 1982.03.25
申请号 DE19792962212 申请日期 1979.10.23
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ETABLISSEMENT DE CARACTERE SCIENTIFIQUE TECHNIQUE ET INDUSTRIEL 发明人 BENSAHEL, DANIEL;PFISTER, JEAN-CLAUDE;REVOIL, LOUIS
分类号 H01L31/10;H01L21/205;H01L31/0296;H01L31/12;H01L33/00;(IPC1-7):01L31/12;01L31/10;01L33/00 主分类号 H01L31/10
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