发明名称 ETCHING FOR SOLDERED ELECTRODE
摘要 PURPOSE:To eliminate a defective soldered electrode without corroding an underlying metal, by a method wherein vapor including oxygen is guided in a glacial acetic acid or acetic acid solution and a soldered electrode including lead and tin to be removed is left in the solution. CONSTITUTION:An Si substrate 1 having solder is left in glacial acetic acid foamed oxygen to perform etching and a defective soldered electrode 9 is removed. After removing the solder, a soldered electrode is newly formed again. This method completely eliminates lead and tin layers only forming solder without damaging an underlying metal.
申请公布号 JPS5750454(A) 申请公布日期 1982.03.24
申请号 JP19800125327 申请日期 1980.09.11
申请人 HITACHI SEISAKUSHO KK 发明人 MURAMATSU SHINICHI;OOJI YUZURU;MUKAI KIICHIROU
分类号 H01L21/60 主分类号 H01L21/60
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