发明名称 PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To prevent the occurrence of spots by forming a thin Al2O3 layer having a specified thickness on a Al support, laying a photosensitive nonsilver layer and a photosensitive layer contg. silver halide on the thin layer in succession, and adding a specified amount of a mercapto compound to at least one of the photosensitive layers. CONSTITUTION:The surface of an Al plate is anodically oxdized to form an Al2O3 film having >=1g/cm<2>, and on the film a photosensitive nonsilver layer contg. a mercapto compound represented by formula I, II, III or IV [where M is H or an alkali metallic atom, A is (substituted) aryl, R is H or (substituted) alkyl, Z is atoms required to complete an aromatic ring which may have a substituent, Y is a divalent hetero atom, P is -SM, NH2, alkylamino, SR or OR] as well as a diazide compound and a photosensitive layer contg. silver halide are laid in succession to obtain a PS plate. Thus, a superior lithographic plate causing no spots in the plate making process is obtd.
申请公布号 JPS5748733(A) 申请公布日期 1982.03.20
申请号 JP19800124358 申请日期 1980.09.08
申请人 FUJI SHASHIN FILM KK 发明人 SHIBA EISUKE;NAKAO JIYOU;TOYAMA TADAO
分类号 G03F7/00;B41N1/08;G03C1/77;G03F7/06;G03F7/095 主分类号 G03F7/00
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