| 摘要 |
PURPOSE:To clean and dry a substrate by method wherein a swirl-making chamber is provided on the surface of a rotatable retaining stand which retains the substrate, a fluid is jetted out and a swirl is formed in the swirl- making chamber and by utilizing the negative pressure of the swirl, the substrate is retained at the position lifted up from the surface of the retaining stand. CONSTITUTION:The swirl-making chamber 2 having a round aperture is formed on the surface of the rotatable retaining stand 1 whereon the substrate O is carried and an introducing hole 3 is provided in the direction of tangential line on the side wall of the swirl-making chamber 2. At the end section of the retaining stand 1, protrusions 4 to be used for control of the sliding of the substrate O are provided. The cleaning and drying of the substrate is performed as follows. First, when a compressed fluid is feeded to a compressed chamber 7, the compressed fluid passes through the introducing hole 3 and jets into the swirl-making chamber 2 and a swirl is generated. The substrate O is adsorbed to the retaining stand 1 with the help of the negative pressure generated by the swirl, but as the fluid flows in the directon of the end section passing through the space between the substrate and the retaining stand 1, the reverse side of the substrate O is retained without coming into contact with the retaining stand 1. The cleanig of the surface of the substrate O is performed by rotating the retaining stand under the abovementioned state of condition and subsequently, the substrate is dried up by performing centrifugal dehydration. |
