| 摘要 |
PURPOSE:To easily detect a defectively patterned section by a method wherein inverted dry plate having the negative and positive reversed and a photomask negative plate are superposed and arranged, and a laser beam generator to be used for scanning and photoelecricity detecting device for detection of the laser beam are provided. CONSTITUTION:The negative plate 1 of a photomask dry plate to be used for the formation of the circuit pattern of a semiconductor and the inverted dry plate 1a, which was reproduced from said negative plate in the reversed negative and positive form, are superposed and arranged, the laser beam emitted from the laser beam generator 4 is scanned through the intermediary of a scanning mirror 5, the transmitted laser beam is detected by the photoelectricity detecting device 8 and amplified by an amplifier 9, and the existence of a defectively patterned section 3 is detected. Through these procedures, the degree of accuracy of space l is relaxed, the process of work can be reduced and the inspecting time can also be cut down. |
