发明名称 |
COMPOSITION AND METHOD FOR FORMING MICROPATTERN |
摘要 |
PURPOSE:To enhance the dimensional stability, working accuracy, etc. of a resist during development by blending a polymer with an aromatic azide compound or the compound and an aromatic compound having a vinyl group to prepare a composition. CONSTITUTION:A composition for forming a micropattern is obtd. by blending a polymer such as polymethyl methacrylate which has no aromatic ring in the principal and side chains and is easily removed by incineration in gas plasma with an aromatic azide compound or the compound and an aromatic compound having a vinyl group. The desired part alone of a coated film of said composition is irradiated with corpuscular radiation or electromagnetic waves, and the aromatic compound in the unirradiated part alone is inactivated in the coated film and removed in gas plasma to form a micropattern. The aromatic azide compound includes 4,4'-diazidodiphenyl ether. |
申请公布号 |
JPS5744143(A) |
申请公布日期 |
1982.03.12 |
申请号 |
JP19800118398 |
申请日期 |
1980.08.29 |
申请人 |
TOKYO OUKA KOGYO KK;TSUDA MINORU |
发明人 |
NAKANE HISASHI;KANAI WATARU;TSUDA MINORU |
分类号 |
C08F2/00;C08F2/54;G03F7/008;G03F7/031;G03F7/36;(IPC1-7):03C1/71;08F2/54;03C1/52;03F7/08;01L21/30 |
主分类号 |
C08F2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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