| 摘要 |
PURPOSE:To facilitate the alignment of a mask with a semiconductor wafer by not adhering photoresist to the vicinity of an alignment mark on the wafer. CONSTITUTION:A mask 14 having a transparent part 14a is mounted only on the vicinity of an alignment mark above a wafer 1 coated with photoresist on the overall surface by a spinner, and the light of a mercury lamp 10 is then emitted via a condenser lens 9 as a parallel beam to the mask 14. When the wafer 1 is developed, the photoresist is removed from the part of the alignment mark. Accordingly, the alignment mark of the wafer 1 from which the photoresist is removed can be clearly detected. |
