发明名称 FORMING METHOD FOR MINUTE PATTERN
摘要 PURPOSE:To shorten a drawing time by irradiating a fixed quantity of particle beams or radiation having the cutting action of a principal chain or a crosslinking of a resist substance onto a main surface of a resist containing a drawing section. CONSTITUTION:A fixed quantity of electron beam showers 4 are irradiated previously onto the whole surface of the electron beam resist 2 on a substrate 1 before drawing. When electron beams 3 for drawing are irradiated, the time may be short. When the surface is developed, the resist pattern 2 is obtained. According to this constitution, the drawing time is short, and working property is excellent.
申请公布号 JPS5742130(A) 申请公布日期 1982.03.09
申请号 JP19800119594 申请日期 1980.08.26
申请人 MITSUBISHI DENKI KK 发明人 MASUKO YOUJI;MATSUKAWA TAKAYUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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