| 摘要 |
PURPOSE:To obtain a fine micropattern by contact exposure by forming a negative or positive type aerobic photosensitive layer on a negative or positive type anaerobic thick photosensitive layer and using the resulting material after removing a peelable protective film adhered to the other side of the anaerobic layer. CONSTITUTION:For example, on one side of a negative type anaerobic thick photosensitive layer 10 a negative type aerobic photosensitive layer 11 is formed, and on the other side a peelable protective thin film 12 is laid to manufacture a photosensitive material 9. When the material 9 is used, the film 12 is removed, the layer 10 is mounted on a substrate 16, and after bringing a photomask 14 having a pattern 15 into contact with the layer 11, the material 9 is exposed to a light source 13. The layer 11, 10 are then developed in succession to obtain a photosensitive layer pattern. Since direct contact exposure is performed unlike a conventional method carrying out exposure through a transparent protective layer and removing the layer, a micropattern of high accuracy is obtd. |
