发明名称 |
NARROW CHANNEL MOS DEVICES AND METHOD OF MANUFACTURING |
摘要 |
NARROW CHANNEL MOS DEVICES AND METHOD OF MANUFACTURING Improved, high performance MOS transistors are provided by a method that includes providing an oxygen-impermeable mask on a selected region of a semiconductor substrate, oxidizing the unmasked portion of the surface to provide a thick oxide at least partially recessed in the substrate, which layer includes a smoothly tapered beak that extends between the margin of the mash and the underlying silicon surface. and, after removing the mask, implanting a selected impurity in the substrate beneath the selected region to form a thin impurity layer that terminates at a sloped portion of the substrate formed by the oxidation step. |
申请公布号 |
CA1119733(A) |
申请公布日期 |
1982.03.09 |
申请号 |
CA19780316831 |
申请日期 |
1978.11.24 |
申请人 |
TEKTRONIX, INC. |
发明人 |
SATO, SHUICHI;YAMAGUCHI, TADANORI;RITCHIE, ARTHUR D. |
分类号 |
H01L21/32;H01L21/336;H01L29/06;H01L29/08;H01L29/10;H01L29/423;H01L29/78 |
主分类号 |
H01L21/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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