| 发明名称 |
PHOTOSENSITIVE COMPOSITION CONTAINING AN ORTHOQUINONE DIAZIDE AND AN ORGANIC RESIN WITH A BASIC AMINO GROUP |
| 摘要 |
<p>The present invention relates to a novel photosensitive composition. In particular, the present invention relates to a photosensitive resin composition suitable for use as a photoresist.</p> |
| 申请公布号 |
CA1119446(A) |
申请公布日期 |
1982.03.09 |
| 申请号 |
CA19780317537 |
申请日期 |
1978.12.07 |
| 申请人 |
TORAY INDUSTRIES INC. |
发明人 |
YOSHINO, TSUNEO;OHBAYASHI, GENTARO |
| 分类号 |
G03C1/54;(IPC1-7):G03C1/54 |
主分类号 |
G03C1/54 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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