发明名称 PHOTORESIST COMPOSITION
摘要 PURPOSE:To enhance the adhesion of a photosensitive resin layer consisting of a water-soluble polymer and a bisazide photocrosslinking agent to a substrate by adding a specified water-soluble silane compound to the layer. CONSTITUTION:To a photosensitive resin composition consisting of a water-soluble polymer such as polyvinylpyrrolidone, polyacrylamide or gelatin and a bisazide crosslinking agent such as 4,4'-bisazidostilbene or sodium 2,2'-disulfonate is added a water-soluble silane compound represented by formula H2N(CH2CH2NH)nCH2CH2 CH2Si(OR)3 (where R is -CH3 or -C2H5, and n is an integer of 2-5).
申请公布号 JPS5741636(A) 申请公布日期 1982.03.08
申请号 JP19800116947 申请日期 1980.08.27
申请人 TOKYO SHIBAURA DENKI KK 发明人 IGARASHI KUNIHIRO;KAWAMOTO MASAHIRO;TAKAMURA TSUTOMU
分类号 C08K5/00;C08K5/544;C08L33/00;C08L33/02;G03F7/075;G03F7/085 主分类号 C08K5/00
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