| 摘要 |
PURPOSE:To simplify the forming process of thin film coil by a method wherein thin film patterns are formed in order transferring or exchanging single or plural masks in a vacuum. CONSTITUTION:The desired coil pattern mask 3 is inserted between a target of a mother material to form the thin film or an evaporation source 1 of a melting pot for evaporation and a substrate 2 of glass, ferrite, etc., and sputtering or evaporation is performed to form the coil of the desired shape on the substrate 2. The device thereof and a mask accomodating shelf, etc., are provided in the vacuum atmosphere, a mechanism being enabled to operate automatically mask exchanging and mask positioning, etc., in this atmosphere is provided, and the thin film patters of multilayers, plural king shapes, are formed by performing automatic treatment. |
