| 摘要 |
PURPOSE:To increase the sensitivity and the efficiency of pattening by the irradiation of an electron beam for the subject device by a method wherein supersonic waves are applied on the electron beam resist when performing an electron beam irradiation and with the help of this energy, the G value of the electron beam resist is improved. CONSTITUTION:The substrate 2 whereon an electron beam resist 3 was applied is placed on a stage 1 and when a patterning is performed using the electron beam 4, a supersonic wave generating element 6 is attached to the stage 1. The energy to be applied to the supersonic wave generating element is feeded by a power source 8. The supersonic waves are sent to the electron beam resist 3 through the intermediaries of the stage 1 and the substrate 2. Through these procedures, lattice osillation energy is increased and the sensitivity of the resist can also be improved. |
