| 摘要 |
PURPOSE:To reduce the steps by forming an amorphous material layer containing as a base silicon atoms on a conductive film formed on a substrate, forming an electrode with the layer as a mask and then forming an ohmic contact layer and a photoconductive layer. CONSTITUTION:An amorphous material layer 103 containing as a base silicon atoms and at least one of hydrogen and halogen atoms is formed on a conductive film 102 formed on a substrate 101. With the layer as a mask an electrode 104 is formed, and ohmic contact layers 105, 107, and a photoconductive layer 106 are then formed. In this manner, the steps are reduced, the work is simplified, and the reliability is improved. |
