| 摘要 |
PURPOSE:To enable the visual identification of the state of an alloy layer of metallic material of a monitor pattern made of Au and Al of metallic material formed partly on the region of a semiconductor substrate for the state of various heat treating steps. CONSTITUTION:Electrodes of source 2, drain 3 and gate 4 are formed on a substrate 6, and monitor patterns 5a, 5b for heat treatment are further formed. The pattern 5a is formed of the same metallic material as the source and drain electrodes, and the pattern 5b is formed of the same metallic material as the gate electrode, and the uppermost layer is formed of Au and Al. After the monitor patterns are formed, a heat treatment is carried out to stabilize the gate electrode, and an alloy layer 7 of Au and Al is formed. The width W can be readily visually measured. In this manner, the state of the heat treatment can be visually and quantitatively identified. |
