| 摘要 |
PURPOSE:To easily form an extremely thin glass coating without any pinholes by heating the particle film consisting essentially of silicic acid obtained by supplying a glass type raw material on a metallic surface and causing oxidation reaction in flames in a temp. region at which said metal is not melted. CONSTITUTION:Mainly a wire-or strip-like metal is fed into a sealed vessel made of quartz having a gas supply system and a gas exhaust system, and gaseous mixture consisting essentially of SiCl4, H2, O2 are flame hydrolyzed in this vessel. As result, the particle film consisting essentially of SiO2 which is the product of reaction is formed on the surface of said metal. Thence, this particle film is heated usually at temps. around 1,500 deg.C at which the metal is not melted, by a ''Siliconit '' furnace, furnace, a high frequency furnace or an oxygen burner, whereby it is turned to transparent glass and a quartz type glass film of <=several mum is formed. If the m.p. of the metal is below the vitrification temp., it is a good practice to heat only the surface thereof to high temp. instantaneously. The metal above the vitrification temp. includes, for example, Pt, and Rh, whilist the metal below the vitrification temp. includes, for example copper, iron, etc. |
