| 摘要 |
PURPOSE:To enhance the adhesion of a photoresist film to a substrate by adding a photocrossliniking agent soluble in an org. solvent and a specified compound to a cyclized conjugated diene polymer. CONSTITUTION:To 100pts.wt. cyclized conjugated diene polymer (A) having 5- 95% residual double bond content such as cyclized cis-1,4-polyisoprene are added 0.1-10pts.wt. photocrosslinking agent (B) soluble in an org. solvent such as 4,4'- diazidostilbene and 0.1-1.0pts.wt. compound (C) represented by formula I or II (where each of R1-4, R6 and R7 is H, aralkyl, alkyl, alkenyl or aryl; R5 is H or aryl; and R8 is H or amino). Using the resulting composition a reduction in the resolution of a photoresist film due to halation on a substrate having a stepped structure and high reflectance can be prevented with high reproducibility independently of the prebaking conditions. |
