| 摘要 |
PURPOSE:To execute safe and uniform boron processing, by subjecting a metallic diaphragm to the boron processing through heating the metallic diaphragm and high purity boron in a vacuum vessel. CONSTITUTION:A titanium diaphragm 16 is held on a frame 12 located on a dish 13 spreading high purity boron 11 in a heat resistant vessel 14, the vessel 14 is evacuated to a high vacuum (10<-6>-10<-8> Torr.) and it is heated to 900-1,200 deg.C the heater 10 in a furnace 15. In this case, the high purity boron 11 is gasified and reaches a titanium diaphragm 16 through a gas vent 8 to subject the same to boron processing. |
