| 摘要 |
<p>PURPOSE:To produce a color filter without causing damages on a vapor deposited dye layer by forming a mask pattern on said layer by using a chalcogen glass layer formed on this layer then selectively removing the colored layer. CONSTITUTION:A vapor deposited colored layer 2 is formed on a substrate 1 and a chalcogen glass layer 3 is formed thereon. Pattern exposure 7 is then made thereon through an original pattern 4, after which the chalcogen glass layer in the exposed part is etched off, whereby a master pattern 5 is formed. Thence, the vapor deposited colored layer not covered with the mask pattern 5 is removed with a prescribed etching process, whereby color elements 6 are formed. Thence, the treatment for removing the pattern 5 is carried out. If an uncolored, transparent or extremely pale pattern is used for this mask pattern 5, there is no particular need for this treatment process.</p> |
