2-(HALOGENOMETHYL-PHENYL)-4-HALOGENO-OXAZOLE DERIVATIVE, MANUFACTURE AND RADIATION-SENSITIVE COMPOSITION CONTAINING SAME

摘要

This invention relates to a novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 2-halogenomethyl-phenyl)-4-halogeno-oxazole derivative; and to a process for the preparation of the novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivatives.