发明名称 DIFFUSION DEVICE FOR SEMICONDUCTOR
摘要 PURPOSE:To improve operation efficiency by forming an opening, which can be sealed hermetically by means of a port supportint base, at the lower surface of a furnace core tube. CONSTITUTION:The supporting base 14 is positioned just under the opening 13 of the lower surface of a wafer going-in-and-out section 11. When a cradle 16 for a boat 4 holding wafers 3 is carried and placed on the base 14, the base 14 rises, the cradle 16 is inserted into the opening 13 and the opening is sealed. The nose of a bar 15 is connected to a notch 17, the bar 15 is driven and carried to a predetermined position 8, an inserting hole for the bar 15 is sealed hermetically by means of a projecting section 18, and the furnace core tube 1 is brought to a completely sealed condition. The bar is taken out through reverse operation after diffusion is completed. According to ths constitution, operating efficiency is improved largely.
申请公布号 JPS5731132(A) 申请公布日期 1982.02.19
申请号 JP19800106093 申请日期 1980.08.01
申请人 SUWA SEIKOSHA KK 发明人 MIYAZAWA KAZUHISA
分类号 H01L21/22;H01L21/00;H01L21/677;(IPC1-7):01L21/22 主分类号 H01L21/22
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