| 摘要 |
<p>PURPOSE:To almost perfectly intercept light even if external light is applied to the substrate surface, by forming the second metallic layer in the opening section of the first metallic layer. CONSTITUTION:An Al 19 is provided on a substrate 18 to etch the Al by applying an electron-beam resist mask to the Al. Then the second Al 21 is formed, and the resist mask 20 is removed. With said constitution applied to an IC for liquid crystal display panel, the second Al layer closes the gap of the first Al wiring 29 for shade, therefore light will not reach the semiconductor substrate. Accordingly, no light leakage current will be created. In addition, by said constitution, a new photoetching process is unnecessary for the pattern formation of the second metallic layer, therefore high yield and low cost will be materialized.</p> |
