| 摘要 |
PURPOSE:To improve the production efficiency of B<+> ion by providing a spattering mechanism in an ion generating section. CONSTITUTION:A target 21 is held at the tip of a gas guide tube 4. When producing B<+> ion said target 21 is composed of metal polonium or a conductive member coated with metal polonium. A plasma production electrode 23 is provided such that the tip is placed at the front of the target 21. The rear end of said electrode 23 is led out to the outside penetrating through an insulator 10 mounted on a supporting board 2. A power source 24 is connected between the rear end of said electrode 23 and the supporting board 2 (Target 21) while another power source 25 is connected between the supporting board 2 (Target 21) and an outer wall tube 1 (Ion take- out electrode 11). |
