发明名称 |
PHOTOLABILE BLOCKED SURFACTANT |
摘要 |
A photosensitive element is provided by an actinic radiation-transmissive film-forming polymeric material which contains photolabile blocked surfactant capable upon exposure to actinic radiation of releasing a detectable quantity of surfactant in actinic radiation exposed areas in areas not exposed to actinic radiation and unblocked surfactant in an image-wise pattern in the actinic radiation exposed areas. An imaging process is also provided comprising providing the actinic radiation-sensitive element and exposing the actinic radiation-sensitive element to actinic radiation in an image-wise pattern at an intensity and for a time sufficient to release an image-wise pattern of released surfactant in the exposed area. |
申请公布号 |
AU7393481(A) |
申请公布日期 |
1982.02.18 |
申请号 |
AU19810073934 |
申请日期 |
1981.08.10 |
申请人 |
MINNESOTA MINING AND MANUFACTURING CO |
发明人 |
G.L. EIAN;J.E. TREND |
分类号 |
C07C69/007;C07C67/00;C07C209/00;C07C227/00;C07C231/00;C07C233/05;C07C233/13;C07C233/15;C07C233/36;C07C233/38;C07C233/40;C07C233/47;C07C233/49;C07C233/51;C07C233/65;C07C301/00;C07C309/63;C07D215/18;G03C1/73;G03F7/004;G03F7/09;G03F7/34 |
主分类号 |
C07C69/007 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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