| 摘要 |
PURPOSE:To obtain a uniform molecular beam and to form a thin film of equialized quality of a method wherein the inside of a molecular beam source cell is divided into plural small chambers, the material for formation of a molecular beam is molten and gasificated in the first chamber the molecular beam is heated again in the second chamber and moreover the molecular beam is transferred in the adjoining small chamber to be heated again. CONSTITUTION:The inside of the molecular beam source cell is divided into the small chambers 12, 13, 14 having the group of heaters 20, 21, 22. The molecular beam source material of Ga 23 is filled up in the first chamber 12, and when it is heated in a vacuum, Ga in the first small chamber is evaporated, transfers through small holes 17, 18 to the second and third coupled chambers to be heated again, and jumps out from a spouting hole 19 onto the substrate forming the uniform molecular beam of single molecule. Accordingly the uniform thin film can be formed having favorable reproducibility. |
