| 摘要 |
PURPOSE:To simplify the manufacture of the glass substrate having a surface of optional curvature by a method wherein an etching is performed on the glass using the convex-lens formed photoresist film which is selectively provided on the glass substrate as a mask. CONSTITUTION:A photoresist is selectively applied on a quartz plate 1 of 0.5mm. or thereabouts in thickness, the photoresist film of a convex-lens form is applied utilizing the surface tension of the resist itself, a convex-lens form curved surface 3 is formed by performing an ion etching on the quartz plate using said photoresist film as a mask and then the damaged surface is smoothed by performing a heat treatment. As a result, when the laser annealing is performed using the above-mentioned procedures, desired annealing pattern can be obtained and also the above can be used as a focussing lens for a photo semiconductor. |
