Plasma etching electrode.,申请号EP19810105551-传众专利搜索

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发明名称	Plasma etching electrode.
摘要
申请公布号	EP0045858(A2)	申请公布日期	1982.02.17
申请号	EP19810105551	申请日期	1981.07.15
申请人	EATON CORPORATION	发明人	ZAJAC, JOHN
分类号	H01L21/302;H01J37/32;H01L21/3065;(IPC1-7):H01L21/30;C23F1/00	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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