| 发明名称 |
DISCHARGE DEVICE AND METHOD FOR USE IN PROCESSING SEMICONDUCTOR DEVICES |
| 摘要 |
<p>The present invention relates to an apparatus and method for making electrical connections between a conductive region through an insulating layer and more particularly to a method for use in the manufacture of semiconductor devices which prevents charge accumulation during exposure by a charged beam.</p> |
| 申请公布号 |
CA1118535(A) |
申请公布日期 |
1982.02.16 |
| 申请号 |
CA19780312138 |
申请日期 |
1978.09.26 |
| 申请人 |
FUJITSU LIMITED |
发明人 |
ZASIO, JOHN J.;SAMUELS, MICHAEL W. |
| 分类号 |
H01L21/027;(IPC1-7):H01L21/44 |
主分类号 |
H01L21/027 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
