发明名称 Apparatus for handling and treating wafers
摘要 A wafer processing system for spin processing photoresist liquid on a silicon wafer and automatically sequencing them through the processor includes a shuttle having upper and lower air bearing slides. The upper slide receives the wafer from a supply magazine and centers it on a rotating chuck and the lower slide of the shuttle receives the wafer from the chuck and allows it to be transferred to a receive track.
申请公布号 US4315705(A) 申请公布日期 1982.02.16
申请号 US19770779075 申请日期 1977.03.18
申请人 GCA CORPORATION 发明人 FLINT, ALAN G.
分类号 B65G51/03;H01L21/677;H05K13/02;(IPC1-7):B65G51/02 主分类号 B65G51/03
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