| 摘要 |
PURPOSE:To eliminate the superposed parts of an electrochromic (EC) film and an insulation film by laminating an electrode, an EC material and a photoresist layer on a substrate, and performing patterning of the electrode and patterning of the EC display separately then forming the insulation layer on the electrodes. CONSTITUTION:After a transparent conductive film 2 is formed on a glass substrate 1, an EC material (WO3 or the like) film 3 is formed thereon, and further photoresist 9 is coated on the film 3 and is exposed and developed, whereby the film 3 is etched to the shape of electrode lead-out patterns. Next, with the film 3 as a mask, the film 2 is dry etched by gaseous CF4. Next, display electrode patterns are exposed on the photoresist 9, and are developed to etch the EC film 3, followed by washing. Next, an insulation film 8 is formed over the entire surface of the substrate 1 by vapor deposition or the like of SiO2, after which the photoresist 9 is removed with acetone or the like by ultrasonic cleaning and the SiO2 film 8 thereon is also removed. In this way, the superior EC display device wherein the conductive film 2 is not exposed to electrolyte and the occurrence of decoloring owing to overlapping of the film 8 and the EC layer 3 is obviated, is obtained. |
