发明名称 MANUFACTURE OF HYBRID INTEGRATED CIRCUIT
摘要 <p>PURPOSE:To simplify the mask pattern and to make resistors suitable for a resistor array and the like, by a method wherein a plurality of resistors to be provided on a substrate are connected in parallel to obtain standardized pattern resistors, and the pattern is trimmed to obtain a predetermined resistance value. CONSTITUTION:For example, as a standard pattern, a construction in which three resistor films 7-9 are connected in parallel between electrodes 2, 2 is formed. In order to make the character of the resistor films 7-9 the same, the resistance values of the resistor films 7-9 are determined so as to have relationship of R1< R2<R3, to obtain a wide range of resistance values. For example, when the rated value R0 of the resistor to be required is shown by R2<R0<R2MAX (wherein R2 MAX is the maximum resistance obtained by trimming R2), the resistor films 7, 9 are cut and the trimming 4 of, for example, L shape is applied to the resistor film 8. For the trimming and the cutting, for example, laser is used. Thus a plurality of resistors having various rated values respectively are manufacured easily without using a number of masks.</p>
申请公布号 JPS5728350(A) 申请公布日期 1982.02.16
申请号 JP19800103442 申请日期 1980.07.28
申请人 FUJITSU LTD 发明人 FUKUSHIMA YASUMASA;TAWARA RITSU
分类号 H01C17/24;H01L21/70;H01L27/01 主分类号 H01C17/24
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