发明名称 Light-emitting semiconductor device and method of fabricating same
摘要 A light-emitting semiconductor device of the type having a substrate, a first layer of a semiconductor on the substrate and a second layer of a different conductivity on the first layer. The second layer is selectively voided so as to give a recess and leave the first layer uncovered in a region serving as the bottom of the recess. An ohmic electrode layer is selectively formed on the second layer so as to extend into the recess and contact with the uncovered region of the first layer, and another ohmic electrode layer is selectively formed on the second layer so as to be separated from the former electrode layer. A solder bump is built up on the first electrode layer to fill up the recess and another solder bump on the second electrode layer so as to be separated from the former solder bump. Selective voiding of the second layer is accomplished by initially covering the entire area of the first layer with the second layer and then selectively slotting the second layer to a depth greater than the thickness of the second layer.
申请公布号 US4316208(A) 申请公布日期 1982.02.16
申请号 US19800155007 申请日期 1980.05.30
申请人 MATSUSHITA ELECTRIC INDUSTRIAL COMPANY, LIMITED 发明人 KOBAYASHI, HIROYUKI;HASHIMOTO, MASAFUMI
分类号 H01L21/60;H01L33/32;H01L33/40;H01L33/58;H01L33/62;(IPC1-7):H01L29/06;H01L23/48;H01L29/44 主分类号 H01L21/60
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