发明名称 SCANNING TYPE ELECTRON MICROSCOPE
摘要 PURPOSE:To substantially remove contamination of the objective visual field of a sample to be observed without using high vacuum and obtain a high resolution scanning image by irradiating an electron beam on the objective visual field through the operation of a visual field shifting circuit. CONSTITUTION:The electron beam 1 which is emitted from an electron gun 5 is converged on a sample 2. The secondary electron signals 9 which are generated from the surface of the sample 2 are detected 10, amplified 11, and displayed on the screen of a CRT13 as an image. The electron beam 1 which irradiates the surface of the sample 2 is scanned two-dimensionally. This scanning sends the electrical signal which is driven by a deflection power supply 16 to a deflector 7, through a magnification converter 19 and thus deflects electron beam. Since the deflection power supply 16 synchronizes with the deflector 7 and drives the deflector 14 of the CRT13, the secondary electron signals 9 which synchronize with the electron beam on the sample 2 are displayed on the CRT13. When the magnification converter 19 and the visual field shifting circuit 20 are at operating status, the electron beam 1 is irradiated at the visual field near-by which is not overlapped with the objective visual field and magnification is also improved.
申请公布号 JPS5727548(A) 申请公布日期 1982.02.13
申请号 JP19800101174 申请日期 1980.07.25
申请人 HITACHI LTD 发明人 SAITOU NAOTAKE
分类号 H01J37/20;H01J37/21;H01J37/22;H01J37/28 主分类号 H01J37/20
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