发明名称 ENERGY RAY SENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To improve the sensitivity and the oxygen plasma resistant property of the titled composition by using the composition contg. a specified alkaline soluble siloxane polymer for the titled composition. CONSTITUTION:The titled composition contains a silicone resin shown by formula I or II, an orthonaphthoquinone compd. shown by formula III and the polymers contg. repeating units shown by formulas IV and V respectively. In the formulas, X is R-C(=O)- or R-C(-OH)H- group (wherein R is a hydrocarbon group), etc., R'-R''' are each hydroxyl or alkyl group, etc., (l), (m), (n) and (p) are each 0 or a positive integer, Z is -OH or -OCl group, etc., R4 is hydrogen atom or phenyl group, etc., Y is hydrogen atom or alkyl group, etc., T is -S(=O)2-, or -O-C(=O)-O- group, R5 is hydrogen atom or alkyl group, etc. And, the photosensitive composition contains preferably the resin shown by formula I or II and the compd. shown by formula III, and the radiation sensitive composition contains preferably the compd. shown by formula I or II, and the polymer contg. the repeating unit shown by formula IV or V.
申请公布号 JPS63239440(A) 申请公布日期 1988.10.05
申请号 JP19870197787 申请日期 1987.08.07
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 TANAKA HARUYORI;IMAMURA SABURO;ONOSE KATSUHIDE
分类号 G03C1/72;G03F7/004;G03F7/022;G03F7/039;G03F7/075;H01L21/027 主分类号 G03C1/72
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