METHOD OF WORKING

摘要

PURPOSE:To accomplish fine working without use of a photoresist or an electronic resist by sublimating or evaporating material through a reaction of the material and ion with irradiaton of an accelerated ion beam on a substrate. CONSTITUTION:An oxygen ion beam 4 with an accelerated voltage of 10-30kV is irradiated on a part to be etched away of a molybdenum thin film 3 formed on a subtrate 1 and a molybdenum oxide is formed through a reaction of oxygen ion and molybdenum. The molybdenum oxide thus formed is sublimated away due to a high local temperature caused by the ion beam 4. The use of such beam can improve the accuracy of the working eliminating resists.