| 摘要 |
PURPOSE:To improve the accuracy of fine working by chemical etching by specifying the ratio of nitric acid and hydrogen peroxide in etching liquid for Ni-Fe plating films. CONSTITUTION:In an etching liquid composition consisting of nitric acid, hydrogen peroxide and water, the nitric acid is limited to 3.3-8.4% and hydrogen peroxide to 10.0-16.7%. If this etching liquid is used for chemical etching of fine working such as Ni-Fe films, the good Ni-Fe films of high working accuracy are obtained. The etching liquid of such composition is suited for making of electromagnetic transducers and the like. |
