发明名称 PHOTOSENSITIVE MATERIAL FOR LITHOGRAPHIC ORIGINAL PLATE
摘要 PURPOSE:To obtain a photosensitive material showing a remarkable hue change at the exposed part, forming a visible image of high contrast and giving a superior imge by development under a yellow safelight lamp after exposure by adding a condensate of naphthoquinone diazido-sulfone and an azo compound. CONSTITUTION:A coating material is prepared by dissolving a compound represented by formula I or II (where each of Ar and Ar' is an optionally substituted benzene ring) in ethylcellosolve or the like together with alkali-soluble phenol-formaldehyde resin or a condensate of an o-quinone diazide compound. By applying the coating material to an Al plate and drying it a photosensitive layer is formed to obtain a lithographic original plate. When the plate is exposed through an original, the exposed part lone discolors remarkably to obtain a latent image which can be seen under a safelight lamp, and the exposed part is thoroughly removed by dissolution in an alkaline developer. Thus, a fine image is obtd.
申请公布号 JPS5711337(A) 申请公布日期 1982.01.21
申请号 JP19800084779 申请日期 1980.06.23
申请人 RICOH KK 发明人 SUWA MASAYUKI;KANEKO GIICHI
分类号 G03C1/72;C09B43/12;C09B43/24;G03F7/00;G03F7/022 主分类号 G03C1/72
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