发明名称 DEVICE FOR PLASMA ANODIZING
摘要 PURPOSE:To enable the anodizing only by active oxygen particles which do not deteriorate the electrical characteristics of the boundary between an oxide layer and a base substance to be treated by separating a plasma source from a substance to be oxidized spatially and further applying a cusp shaped field between them. CONSTITUTION:The oxygen plasma generated in a plasma source 10 diffuses downstream in a vacuum container 12. Excitation of an air-core coil 18 is performed in opposite direction to that of an air-core coil 17 so as to produce a cusp shaped field between the plasma source 10 and a sample to be oxidized 14. By this operation, charged ions and electrons mostly hit against the wall of the vacuum container and are recombined to lose their energies. Meanwhile, the oxygen exciting seeds which are electrically neutral and are included in an oxygen plasma are carried to the surface of the sample 14 without being influenced by the cusp shaped field. Then +50V is applied to the sample 14 by a bias power source 16 under heating and a vacuum, and it is irradiated with low-speed electrons in the secondary plasma so as to promote oxidizing reaction.
申请公布号 JPS60103626(A) 申请公布日期 1985.06.07
申请号 JP19830210835 申请日期 1983.11.11
申请人 HITACHI SEISAKUSHO KK 发明人 MIYAKE KIYOSHI;KIMURA SHINICHIROU;KETSUSAKO MITSUNORI
分类号 H01L21/31;C23C8/36;H01J37/32;H01L21/316;(IPC1-7):H01L21/316 主分类号 H01L21/31
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